High Dielectric Constant Materials: VLSI Mosfet Applications
Huff, H. R. (EDT)/ Gilmer, D. C. (EDT)
R 8 369.00
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- 26 Sep 2026
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Description
Issues relating to the high-K gate dielectric are among the greatest challenges for the evolving International Technology Roadmap for Semiconductors (ITRS). This book includes topics such as: a review of Moore's Law; the classical regime for SiO2 gate dielectrics; and the transition to silicon oxynitride gate dielectrics.